Optoelectronic Properties of Antimony Doped Tin Oxide Thin Films Obtained by Spray Pyrolysis

Structural and electrical properties of In-doped vanadium oxide thin films prepared by spray pyrolysis

The In-doped vanadium pentoxide nanostructures with different doping levels including 0, 10, 20 and 30 at.% were prepared by the spray pyrolysis technique. The prepared thin films were characterized by the x-ray diffraction (XRD) and scanning electron microscopy (SEM). The XRD results revealed that the films were crystalline in tetragonal phase. Increasing the In-doping level made the structure...

Cadmium Oxide Thin Films Deposited by a Simplified Spray Pyrolysis Technique for Optoelectronic Applications

Cadmium oxide thin films were fabricated on glass substrates by a simplified and low cost spray pyrolysis technique at different substrate temperatures. The X-ray diffraction study showed that irrespective of substrate temperature all the films exhibits a preferential orientation along the (1 1 1) plane. The values of crystallite size were found to be in the range 20.72 – 29.6 nm. The perce...

Antimony-doped Tin(II) Sulfide Thin Films

Thin-film solar cells made from earth-abundant, inexpensive, and non-toxic materials are needed to replace the current technologies whose widespread use is limited by their use of scarce, costly, and toxic elements. Tin monosulfide (SnS) is a promising candidate for making absorber layers in scalable, inexpensive, and non-toxic solar cells. SnS has always been observed to be a p-type semiconduc...

cadmium oxide thin films deposited by a simplified spray pyrolysis technique for optoelectronic applications

Fabrication and characterization of fluorine-doped thin oxide thin films and nanorod arrays via spray pyrolysis

This paper reports the synthesis and characterization of fluorine-doped tin oxide (FTO) thin films via intermittent spray pyrolysis utilizing a solution mixture of tin chloride pentahydrate and ammonia fluoride. Utilizing the same solution, nanorod arrays were fabricated via template-based growth. Uniform and crack-free FTO films over 20×20 mm with a thickness up to 900 nm have been routinely a...